ION-BEAM-ASSISTED DEPOSITION OF METAL NANOCLUSTERS IN SILICA THIN-FILMS

Authors
SCHIESTEL S COTELL CM CAROSELLA CA GRABOWSKI KS HUBLER GK
Citation
S. Schiestel et al., ION-BEAM-ASSISTED DEPOSITION OF METAL NANOCLUSTERS IN SILICA THIN-FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 566-569
Citations number
8
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
127
Year of publication
1997
Pages
566 - 569
Database
ISI
SICI code
0168-583X(1997)127:<566:IDOMNI>2.0.ZU;2-Z
Abstract
Gold and silver nanoclusters in silica were deposited by coevaporation of gold and silicon or silver and silicon under simultaneous oxygen b ombardment. The noble metal concentration, the linear absorption coeff icient and the cluster size can be controlled by variation of the proc ess parameters. The position of the absorption peak was shifted from 4 00 to 700 nm by the choice of the cluster metal and the dielectric mat rix.