Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist

Authors
Ito, T Sawada, R Higurashi, E Kiyokura, T
Citation
T. Ito et al., Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist, MICROSYST T, 6(5), 2000, pp. 165-168
Citations number
4
Categorie Soggetti
Instrumentation & Measurement
Journal title
MICROSYSTEM TECHNOLOGIES
ISSN journal
09467076 → ACNP
Volume
6
Issue
5
Year of publication
2000
Pages
165 - 168
Database
ISI
SICI code
0946-7076(200008)6:5<165:FOMUFP>2.0.ZU;2-3
Abstract
A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-bas ed positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromac hines and IC probes.