SYNTHESIS OF MULTIELEMENT THIN-FILMS USING MIXED-METAL PLASMA STREAMS

Multi-element thin films of complex structure have been formed by an i on-energy-controlled, plasma-based method. Metal plasmas produced by t wo independent, filtered, vacuum are guns are directed toward the subs trate and mixed together in a magnetic multipole plasma homogenizer. I on energy is controlled by repetitively pulse-biasing the substrate, p roviding a means to enhance adhesion between the substrate and the gro wing film (by ion mixing at the interface) as well as to modify the fi lm microstructure (by ion assisted deposition). Here we outline the pl asma/ion beam technique and present some examples of films produced, i ncluding silicon-aluminum oxides, and films of refractory metal carbid es. For Al:Si oxides, two plasma sources were used in an oxygen backgr ound and the Al:Si ratio in the films was controlled by varying the re lative are duration; films with Al:Si ratios varying from 2:1 to 8:1 w ere produced. For the case of carbide films, Ti and C plasma streams w ere mixed so as to form films of TixCy. As well as monolithic films, w e have also used this plasma technique to form multilayer structures o f TiC:DLC. The method provides a relatively simple and convenient appr oach to the plasma synthesis of complex multi-element thin films and m ultilayer structures.