FINITE-ELEMENT MODELING OF NANOINDENTATION FOR DETERMINING THE MECHANICAL-PROPERTIES OF IMPLANTED LAYERS AND THIN-FILMS

Citation
Ja. Knapp et al., FINITE-ELEMENT MODELING OF NANOINDENTATION FOR DETERMINING THE MECHANICAL-PROPERTIES OF IMPLANTED LAYERS AND THIN-FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 935-939
Citations number
13
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
127
Year of publication
1997
Pages
935 - 939
Database
ISI
SICI code
0168-583X(1997)127:<935:FMONFD>2.0.ZU;2-0
Abstract
The mechanical properties of implanted layers and thin films on dissim ilar substrates are difficult to determine accurately. Nanoindentation of the layer provides information, but detailed numerical modeling is required in order to separate the properties of the layer from those of the substrate. We describe here the procedures we have developed to accomplish this modeling with the commercially available finite-eleme nt code ABAQUS. Using these techniques, we are able to extract from na noindentation testing the yield stress, Young's modulus, and hardness of the layer material, with an absolute accuracy of at least 20%. The procedure is applicable to layers as thin as 50 nm on essentially any substrate, hard or soft. We have used it for materials ranging from io n-implanted layers to thin films of metals and dielectrics formed usin g plasma-deposition methods. An example is given of O-implanted Al, a thin, hard layer on a soft substrate.