Ja. Knapp et al., FINITE-ELEMENT MODELING OF NANOINDENTATION FOR DETERMINING THE MECHANICAL-PROPERTIES OF IMPLANTED LAYERS AND THIN-FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 935-939
The mechanical properties of implanted layers and thin films on dissim
ilar substrates are difficult to determine accurately. Nanoindentation
of the layer provides information, but detailed numerical modeling is
required in order to separate the properties of the layer from those
of the substrate. We describe here the procedures we have developed to
accomplish this modeling with the commercially available finite-eleme
nt code ABAQUS. Using these techniques, we are able to extract from na
noindentation testing the yield stress, Young's modulus, and hardness
of the layer material, with an absolute accuracy of at least 20%. The
procedure is applicable to layers as thin as 50 nm on essentially any
substrate, hard or soft. We have used it for materials ranging from io
n-implanted layers to thin films of metals and dielectrics formed usin
g plasma-deposition methods. An example is given of O-implanted Al, a
thin, hard layer on a soft substrate.