COMPARISON OF MEASURED AND CALCULATED DOSE FOR PLASMA SOURCE ION-IMPLANTATION INTO 3-D OBJECTS

Plasma source ion implantation is a method for implanting 3-D objects, The homogeneity of the implantation is measured for two cylinders, re presenting drills, and a hale, each with a diameter of 8 mm, and compa red with theoretical calculations. Nitrogen was implanted in aluminum foil covering the samples using plasma source ion implantation with 30 kV pulses. Rutherford backscattering spectroscopy (RBS) was used to m easure the implanted dose at different positions. Using a discrete app roximation for the sheath dynamics, the ion distribution was calculate d with a simple model. The measured and calculated doses are usually i n good agreement for all three samples. The ion dose for the cylinders has an absolute maximum on the top with a position dependent lower do se on the sidewall, In the bottom of the hole the dose was 25% of the dose at the surface, while the dose in the wall was below the RBS dete ction limit.