Metal-semiconductor nanocontacts: Silicon nanowires

Citation
U. Landman et al., Metal-semiconductor nanocontacts: Silicon nanowires, PHYS REV L, 85(9), 2000, pp. 1958-1961
Citations number
22
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
85
Issue
9
Year of publication
2000
Pages
1958 - 1961
Database
ISI
SICI code
0031-9007(20000828)85:9<1958:MNSN>2.0.ZU;2-I
Abstract
Silicon nanowires assembled from clusters or etched from the bulk, connecte d to aluminum electrodes and passivated, are studied with large-scale local -density-functional simulations. Shore (similar to 0.6 nm) wires are fully metallized by metal-induced gap states resulting in finite conductance (sim ilar to e(2)/h). For longer wires (similar to 2.5 nm) nanoscale Schottky ba rriers develop with heights larger than the corresponding bulk value by 40% to 90%. Electric transport requires doping dependent gate voltages with th e conductance spectra exhibiting interference resonances due to scattering of ballistic channels by the contacts.