Df. Murphy et Da. Flavin, Dispersion-insensitive measurement of thickness and group refractive indexby low-coherence interferometry, APPL OPTICS, 39(25), 2000, pp. 4607-4615
We describe a low-coherence interferometric technique for simultaneous meas
urement of geometric thickness and group refractive index of highly dispers
ive samples. The technique is immune to the dispersion-induced asymmetry of
the interferograms, thus overcoming Limitations associated with some other
low-coherence approaches to this simultaneous measurement. We use the expe
rimental configuration of a tandem interferometer, with the samples to be c
haracterized placed in an air gap in one arm of the measurement interferome
ter. Unambiguous, dispersion-insensitive measurements of critical group-del
ay imbalances in the measurement interferometer are determined from the opt
ical frequency dependence of interferogram phases, by means of dispersive F
ourier transform spectrometry. Sample thickness and group refractive index
are calculated from these group delays. A thickness measurement precision o
f 0.2 mu m and group index measurement accuracy of 5 parts in 10(5) across
a wavelength range of 150 nm have been achieved for BK7 and fused-silica gl
ass samples in the thickness range 2000 to 6000 mu m. (C) 2000 Optical Soci
ety of America OCIS codes: 060.2370, 260.2030.