In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens

Citation
Bc. Li et al., In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens, APPL OPTICS, 39(25), 2000, pp. 4690-4697
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
39
Issue
25
Year of publication
2000
Pages
4690 - 4697
Database
ISI
SICI code
0003-6935(20000901)39:25<4690:ISMOUD>2.0.ZU;2-6
Abstract
A simple and sensitive mode-mismatched thermal lens (TL) technique with a p ulsed top-hat beam excitation and a near-field detection scheme is develope d to measure in situ the thermoelastic and the thermooptical responses of u ltraviolet (UV) dielectric coatings as well as bulk materials under excimer laser (193- or 248-nm) irradiations. Owing to its high sensitivity, the TL technique can be used for measurements at fluences far below the laser-ind uced damage threshold (LIDT). We report on the measurement of both linear a nd nonlinear absorption of the UV dielectric coatings and bulk materials as well as the investigation of time-resolved predamage phenomena, such as la ser conditioning of highly reflective dielectric coatings and irradiation-i nduced changes of a coating's various properties. The pulsed TL technique i s also a convenient technique for accurate measurement of the LIDT of diele ctric coatings and for distinguishing different damage mechanisms: thermal- stress-induced damage or melting-induced damage. (C) 2000 Optical Society o f America OCIS codes: 120.6810, 140.3440, 310.6870.