Bc. Li et al., In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens, APPL OPTICS, 39(25), 2000, pp. 4690-4697
A simple and sensitive mode-mismatched thermal lens (TL) technique with a p
ulsed top-hat beam excitation and a near-field detection scheme is develope
d to measure in situ the thermoelastic and the thermooptical responses of u
ltraviolet (UV) dielectric coatings as well as bulk materials under excimer
laser (193- or 248-nm) irradiations. Owing to its high sensitivity, the TL
technique can be used for measurements at fluences far below the laser-ind
uced damage threshold (LIDT). We report on the measurement of both linear a
nd nonlinear absorption of the UV dielectric coatings and bulk materials as
well as the investigation of time-resolved predamage phenomena, such as la
ser conditioning of highly reflective dielectric coatings and irradiation-i
nduced changes of a coating's various properties. The pulsed TL technique i
s also a convenient technique for accurate measurement of the LIDT of diele
ctric coatings and for distinguishing different damage mechanisms: thermal-
stress-induced damage or melting-induced damage. (C) 2000 Optical Society o
f America OCIS codes: 120.6810, 140.3440, 310.6870.