A new method for thin film deposition - Faced microwave electron cyclotronresonance plasma sources enhanced direct-current magnetron sputtering

A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CNx f ilms has been prepared by using this system. The characterization of the fi lms by interference microscopy, atomic force microscopy, and x-ray photoele ctron spectroscopy shows that the deposition rate is strongly affected by t he direct-current bias, and the films are composed by a single carbon nitri de phase and the N/C ratio is 4:3.2, which is close to that of C3N4 (4:3).