Optical properties of hydrogenated amorphous silicon carbide films

Authors
Choi, WK
Citation
Wk. Choi, Optical properties of hydrogenated amorphous silicon carbide films, DEFECT DIFF, 177-1, 2000, pp. 29-42
Citations number
48
Categorie Soggetti
Current Book Contents
Journal title
DEFECTS AND DIFFUSION IN CERAMICS: AN ANNUAL RETROSPECTIVE II → ACNP
ISSN journal
10120386
Volume
177-1
Year of publication
2000
Pages
29 - 42
Database
ISI
SICI code
1012-0386(2000)177-1:<29:OPOHAS>2.0.ZU;2-2
Abstract
The influence of plasma enhanced chemical vapour deposition conditions (rf power, hydrogen dilution), hydrocarbon source material, dopants and deposit ion techniques on the optical properties of hydrogenated amorphous silicon carbide (a-Si1-xCx:H) films were examined. The parameters used for the disc ussion were the optical gap, the refractive index and the edge width parame ter. The photoluminescence results of a-Si1-xCx:H films were also presented in this paper.