The influence of plasma enhanced chemical vapour deposition conditions (rf
power, hydrogen dilution), hydrocarbon source material, dopants and deposit
ion techniques on the optical properties of hydrogenated amorphous silicon
carbide (a-Si1-xCx:H) films were examined. The parameters used for the disc
ussion were the optical gap, the refractive index and the edge width parame
ter. The photoluminescence results of a-Si1-xCx:H films were also presented
in this paper.