A comprehensive analysis methodology allowing investigation of the RF perfo
rmance of Si and strained Si:SiGe MOSFETs is presented. It is based on tran
sient ensemble Monte Carlo simulation which correctly describes device tran
sport, and employs a finite element solver to account for complex device ge
ometries. Transfer characteristics and figures of merit for a number of exi
sting and proposed RF MOSFETs are discussed.