A computationally efficient method for three-dimensional simulation of ionimplantation

Authors
Burenkov, A Tietzel, K Hossinger, A Lorenz, J Ryssel, H Selberherr, S
Citation
A. Burenkov et al., A computationally efficient method for three-dimensional simulation of ionimplantation, IEICE TR EL, E83C(8), 2000, pp. 1259-1266
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEICE TRANSACTIONS ON ELECTRONICS
ISSN journal
09168524 → ACNP
Volume
E83C
Issue
8
Year of publication
2000
Pages
1259 - 1266
Database
ISI
SICI code
0916-8524(200008)E83C:8<1259:ACEMFT>2.0.ZU;2-6
Abstract
The high accuracy which is necessary for modern process simulation often re quires the use of Monte-Carlo ion implantation simulation methods with the disadvantage of very long simulation times especially for three-dimensional applications. In this work a new method for an accurate and CPU time effic ient three-dimensional simulation of ion implantation is suggested. The app roach is based on a combination of the algorithmic capabilities of a fast a nalytical and the Monte-Carlo simulation method.