The high accuracy which is necessary for modern process simulation often re
quires the use of Monte-Carlo ion implantation simulation methods with the
disadvantage of very long simulation times especially for three-dimensional
applications. In this work a new method for an accurate and CPU time effic
ient three-dimensional simulation of ion implantation is suggested. The app
roach is based on a combination of the algorithmic capabilities of a fast a
nalytical and the Monte-Carlo simulation method.