Application of technology CAD in process development for high performance logic and system-on-chip in IC foundry

Authors
Liew, BK Wang, CC Diaz, CH Wu, SY Sun, JYC Lin, YF Kuo, DS Lin, HT Yen, A
Citation
Bk. Liew et al., Application of technology CAD in process development for high performance logic and system-on-chip in IC foundry, IEICE TR EL, E83C(8), 2000, pp. 1275-1280
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEICE TRANSACTIONS ON ELECTRONICS
ISSN journal
09168524 → ACNP
Volume
E83C
Issue
8
Year of publication
2000
Pages
1275 - 1280
Database
ISI
SICI code
0916-8524(200008)E83C:8<1275:AOTCIP>2.0.ZU;2-T
Abstract
The application of Technology CAD simulations for development of IC process es in foundry is presented. Examples include device design, Flash cell desi gn and optical proximity correction for SRAM cell. The challenges of using TCAD tools in the IC foundry is also discussed.