Rl. Stolk et al., Relation between gas phase CN radical distributions, nitrogen incorporation, and growth rate in flame deposition of diamond, J APPL PHYS, 88(6), 2000, pp. 3708-3716
Controlled amounts of nitrogen were added during oxyacetylene flame deposit
ion of diamond to investigate the possible role of the CN radical in the ef
fects of nitrogen addition. CN radical distributions were visualized using
two-dimensional laser induced fluorescence (LIF) and compared with nitrogen
incorporation into the layer and with the diamond growth rate, which were
measured by means of cathodoluminescence (CL) and optical microscopy, respe
ctively. For the studied range of nitrogen flows, it was found that the CN
LIF signal in the center of the flame is linearly dependent on the added am
ount of nitrogen. Diamond deposition in the central region is mainly influe
nced by the deposition parameters, whereas deposition in the outer zone is
largely determined by the interaction of the flame with the ambient; the an
nulus of enhanced growth is affected by both the deposition parameters and
the ambient. By a simple consideration, in which the growth rate is separat
ed in nitrogen dependent and independent contributions, an observed positio
nal difference between CN LIF and growth rate maxima can be explained. Comp
arison of the CN LIF signal, the CL signal and the diamond deposition rate
indicates that CN (or a closely related species) may be the species or one
of the main species responsible for the effects of nitrogen addition during
oxyacetylene flame deposition of diamond. (C) 2000 American Institute of P
hysics. [S0021-8979(00)04717-4].