Decomposition of ethoxyethane in the cold plasma environment

A radio frequency (RF) plasma system was used to decompose the ethoxyethane (EOE) contained gas. The reactants and final products were analyzed by usi ng an FTIR (Fourier Transform Infrared) spectrometer. The effects of plasma operational parameters, including input power wattage (W), equivalence rat ios (Phi), feeding concentration (C) of EOE and total gas flow rate (Q) for EOE decomposition were evaluated. In addition, the possible reaction pathw ays for EOE decomposition and the formation of final products were built up and are discussed in this paper. The mole fraction profiles of C2H5OC2H5, CN3CHO, CH4, C2H6, C2H4, C2H2, CO2 and CO were detected and are also presen ted in this paper. At lower input power wattages, the creation of glow disc harge is strongly dependent on the plasma production index (PPI). When inpu t power wattages are smaller than 30 W, the minimum values of PPI to create glow discharge ranged between 18.2 and 19.0. The results of this study rev ealed that, in the RF plasma reactor, the decomposition fraction of EOE cou ld reach 100% under most operational conditions. (C) 2000 Society of Chemic al industry.