A site-control technique for individual InAs quantum dots (QDs) has been de
veloped by using scanning tunneling microscope (STM) probe-assisted nanolit
hography and self-organizing molecular-beam epitaxy. We find that nano-scal
e deposits can be created on a GaAs surface by applying voltage and current
pulses between the surface and a tungsten tip of the STM, and that they ac
t as "nano-masks" on which GaAs does not grow directly. Accordingly, subseq
uent thin GaAs growth produces GaAs nano-holes above the deposits. When InA
s is supplied on this surface, QDs are self-organized at the hole sites, wh
ile hardly any undesirable Stranski-Krastanov QDs are formed in the flat su
rface region. Using this technique with nanometer precision, a QD pair with
45-nm pitch is successfully fabricated.