We report flicker noise measurements combined with deep-level transient spe
ctroscopy of the doped and undoped channel GaN/AlGaN heterostructure field-
effect transistors. The low-temperature noise spectra for the doped devices
show clear generation-recombination peaks. The value of the activation ene
rgy extracted from these noise peaks is consistent with the activation ener
gies measured using deep-level spectroscopy. Our results indicate that the
input-referred noise spectral density of the undoped channel devices is muc
h smaller (up to two orders of magnitude) than that of the doped channel de
vices with comparable electric characteristics. The additional defects due
to doping add up to the generation-recombination and flicker noise.