Investigation of flicker noise and deep-levels in GaN/AlGaN transistors

Citation
A. Balandin et al., Investigation of flicker noise and deep-levels in GaN/AlGaN transistors, J ELEC MAT, 29(3), 2000, pp. 297-301
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
29
Issue
3
Year of publication
2000
Pages
297 - 301
Database
ISI
SICI code
0361-5235(200003)29:3<297:IOFNAD>2.0.ZU;2-O
Abstract
We report flicker noise measurements combined with deep-level transient spe ctroscopy of the doped and undoped channel GaN/AlGaN heterostructure field- effect transistors. The low-temperature noise spectra for the doped devices show clear generation-recombination peaks. The value of the activation ene rgy extracted from these noise peaks is consistent with the activation ener gies measured using deep-level spectroscopy. Our results indicate that the input-referred noise spectral density of the undoped channel devices is muc h smaller (up to two orders of magnitude) than that of the doped channel de vices with comparable electric characteristics. The additional defects due to doping add up to the generation-recombination and flicker noise.