Optimization of filter properties for recirculating etch baths

Membrane filters are often used to remove small particles from liquids in r ecirculating etch baths (REBs). The ideal filter for this application would have both high particle capture efficiency and high flow permeability. Unf ortunately, filters with high particle capture efficiency often have low pe rmeability because the dominant particle capture mechanism is mechanical si eving. This paper describes more efficient capture mechanisms, interception and diffusion, and a filter with a surface modified to capture particles b y these mechanisms. The filter has the same permeability as a conventional 0.45-mu m filter and retains particles more efficiently than a conventional 0.05-mu m filter. The filter is capable of removing multiple types of smal l (0.065-mu m) particles (polystyrene latex, silicon nitride, alumina, etc. ) with high efficiency (> 99.9 percent).