Fundamental obstacle for electrical spin injection from a ferromagnetic metal into a diffusive semiconductor

Citation
G. Schmidt et al., Fundamental obstacle for electrical spin injection from a ferromagnetic metal into a diffusive semiconductor, PHYS REV B, 62(8), 2000, pp. R4790-R4793
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
62
Issue
8
Year of publication
2000
Pages
R4790 - R4793
Database
ISI
SICI code
0163-1829(20000815)62:8<R4790:FOFESI>2.0.ZU;2-M
Abstract
We have calculated the spin-polarization effects of a current in a two-dime nsional electron gas which is contacted by two ferromagnetic metals. In the purely diffusive regime, the current may indeed be spin-polarized. However , for a typical device geometry the degree of spin-polarization of the curr ent is limited to less than 0.1% only. The change in device resistance for parallel and antiparallel magnetization of the contacts is up to quadratica lly smaller, and will thus be difficult to detect.