Characterization of rf-sputtered platinum films by positron annihilation spectroscopy

Pt films on alumina substrates, both in their as-received and annealed stat es, have been extensively characterized by slow positron implantation spect roscopy (SPIS). Bulk Pt samples have been investigated by conventional posi tron annihilation spectroscopy (PAS) as well as by SPIS. A variety of state -of-the-art theoretical calculations have been performed to aid the interpr etation of experimental findings. The research shows that a re-interpretati on of earlier defect studies of bulk Pt by PAS is required in order to achi eve a satisfactory agreement with the present experimental findings and the ory.