Temperature coefficient of the space-charge scattering mobility dependent on the Ge doping concentration in In0.5Ga0.5P epilayers grown on GaAs (100)substrates

Citation
Tw. Kim et al., Temperature coefficient of the space-charge scattering mobility dependent on the Ge doping concentration in In0.5Ga0.5P epilayers grown on GaAs (100)substrates, SOL ST COMM, 116(3), 2000, pp. 163-166
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
116
Issue
3
Year of publication
2000
Pages
163 - 166
Database
ISI
SICI code
0038-1098(2000)116:3<163:TCOTSS>2.0.ZU;2-K
Abstract
Temperature-dependent mobilities of Ge-doped In0.5Ga0.5P epilayers grown on (100) semi-insulating GaAs substrates by using liquid-phase epitaxy have b een investigated in the temperature range between 77 and 300 K. The space-c harge scattering mobility for the n-type In0.5Ga0.5P epilayer has a tempera ture dependence of T-0.25 to T-1.4, and that for the p-type In0.5Ga0.5P epi layer has a temperature dependence of T-0.5 to T-0.9. This result indicates that the temperature coefficient of the space-charge scattering mobility i s dramatically dependent on the Ge doping concentration in the In0.5Ga0.5P epilayers. (C) 2000 Elsevier Science Ltd. All rights reserved.