Correlation between interfacial segregation and surface-energy-induced selective grain growth in 3% silicon-iron alloy

Citation
Nh. Heo et al., Correlation between interfacial segregation and surface-energy-induced selective grain growth in 3% silicon-iron alloy, ACT MATER, 48(11), 2000, pp. 2901-2910
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
ACTA MATERIALIA
ISSN journal
13596454 → ACNP
Volume
48
Issue
11
Year of publication
2000
Pages
2901 - 2910
Database
ISI
SICI code
1359-6454(20000630)48:11<2901:CBISAS>2.0.ZU;2-9
Abstract
Effects of final reduction and interfacial segregation of sulfur on surface -energy-induced selective grain growth have been investigated in 3% silicon -iron alloy strips with various bulk content of sulfur. Interfacial segrega tion kinetics of sulfur varies with annealing atmosphere: a convex profile under vacuum or hydrogen and a gradual increase under argon. This is becaus e the segregated sulfur evaporates or gasifies to hydrogen sulfide during f inal vacuum or hydrogen annealing, resulting in a sulfur-depleted zone just below the strip surface. The surface-energy-induced selective growth of a grain at time t is determined by the concentration of segregated sulfur. Th e selective growth rate depends on the combined effect of the segregated su lfur and the final reduction that determines the average grain size. For ob taining (110)[001] Goss texture, the final reduction should, therefore, be controlled, depending on the bulk content of sulfur which influences direct ly the segregation kinetics of sulfur and thus the texture development. (C) 2000 Acta Metallurgica Inc. Published by Elsevier Science Ltd. All rights reserved.