Citation
R. Rossler et al., Morphology and electrical properties of pulsed-laser deposited Bi2Sr2CaCu2O8+delta films on vicinal substrates, APPL PHYS A, 71(3), 2000, pp. 245-247
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396
→ ACNP
Volume
71
Issue
3
Year of publication
2000
Pages
245 - 247
Database
ISI
SICI code
0947-8396(200009)71:3<245:MAEPOP>2.0.ZU;2-A
Abstract
Thin films of Bi2Sr2CaCu2O8+delta have been grown on vicinal (001) SrTiO3 s
ubstrates by pulsed-laser deposition. Transmission electron microscopy (TEM
) and X-ray diffraction reveal well ordered films with the c axis of the fi
lm parallel with the c axis of the substrate for miscut angles up to Bs 15
degrees, TEM also reveals the step-like film morphology due to step-flow gr
owth. The in-plane and out-of-plane resistivities are independent of film t
hickness within the range 20-300 nm and agree quite well with Bi2Sr2CaCu2O8
+delta single-crystal data.