Field-electron emission from polyimide-ablated films

Citation
H. Ma et al., Field-electron emission from polyimide-ablated films, APPL PHYS A, 71(3), 2000, pp. 281-284
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
71
Issue
3
Year of publication
2000
Pages
281 - 284
Database
ISI
SICI code
0947-8396(200009)71:3<281:FEFPF>2.0.ZU;2-N
Abstract
Polyimide-ablated film was deposited by using pulsed laser ablation of a po lyimide target, and field-electron emission from the film was observed for the first time. The turn-on field of the polyimide-ablated film is 12 V/mu m. The current density is 0.725 mA/cm(2), and the emission sites density is on the order of 10(6)/cm(2) at the applied field of 24V/mu m. The field-el ectron emission measurements indicate that this kind of film could be a new cold cathode material. It is suggested that the graphite-like clusters con tained in the film play an important role in the field-electron emission.