Ultrasmall, uniform-size (similar to 1 nm) Si nanoparticles, dispersed from
p-type boron-doped silicon, are reconstituted on a Si substrate. Electroni
c transport processes are studied by current-voltage spectroscopy at room t
emperature, using scanning tunneling microscopy, in a two-terminal configur
ation, under both dark conditions and light illumination. Unlike the dark c
onditions, we observe, under light irradiation, for negative tip biasing, a
regular structure at similar to 1.0 eV period. The series is discussed in
terms of light-induced hole states that otherwise are highly infrequent in
ultrasmall Si particles, under standard low doping. (C) 2000 American Insti
tute of Physics. [S0003-6951(00)00237-0].