Effect of nitrogen doping on the electron field emission properties of chemical vapor deposited diamond films

Citation
Cf. Shih et al., Effect of nitrogen doping on the electron field emission properties of chemical vapor deposited diamond films, DIAM RELAT, 9(9-10), 2000, pp. 1591-1599
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
9
Issue
9-10
Year of publication
2000
Pages
1591 - 1599
Database
ISI
SICI code
0925-9635(200009/10)9:9-10<1591:EONDOT>2.0.ZU;2-2
Abstract
Nitrogen-doped diamond films were successfully synthesized using a urea/met hanol saturated solution as a nitrogen source. Scanning electron microscopy (SEM) and Raman spectroscopy revealed that the morphology and quality of t he diamond films were not altered due to nitrogen doping. However, increasi ng the urea/methanol ratio in gas mixture markedly influences the field emi ssion properties of diamond films, which were optimized when the films were grown using H-2/CH4/urea = 300:18:6 seem . The electron field emission of the films can be turned at a low field as 5.0 V mu m(-1) and the emission c urrent density as large as J(e) = 1019 mu A cm(-2) can be attained at 21.6 V mu m(-1) applied field. The effective work function is phi(e) = 0.034 eV. (C) 2000 Published by Elsevier Science S.A. All rights reserved.