In this letter, we report the effects of N2O annealing of interpoly ox
ide on flash cell performance. It is demonstrated that by adding an N2
O anneal after interpoly oxide formation, improved cycling endurance i
s achieved, The program and erase efficiencies are also improved signi
ficantly, compared to the control cell without N2O anneal. The cells w
ith N2O anneal show higher cell current (i.e., drain current), which c
an be ascribed to a lower threshold voltage and higher transconductanc
e, compared to the control cell.