Study of different triazole derivative inhibitors to protect copper against pitting corrosion

Electrochemical experiments were performed to study the inhibitive effect t owards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measureme nts revealed that this compound produced a thinning of the passive film. Th is was corroborated by X-ray photoelectron spectroscopy. Results showed tha t copper pitting resistance could not be explained only by characterizing t he protectiveness of the passive film.