IRON DEPOSITION FROM A FECL2 SOLUTION CONTAINING SUSPENDED SILICON PARTICLES

Citation
A. Hovestad et al., IRON DEPOSITION FROM A FECL2 SOLUTION CONTAINING SUSPENDED SILICON PARTICLES, Journal of Applied Electrochemistry, 27(7), 1997, pp. 756-761
Citations number
26
Categorie Soggetti
Electrochemistry
ISSN journal
0021891X
Volume
27
Issue
7
Year of publication
1997
Pages
756 - 761
Database
ISI
SICI code
0021-891X(1997)27:7<756:IDFAFS>2.0.ZU;2-H
Abstract
The effect of suspended Si particles on Fe deposition from a FeCl2 sol ution was investigated. The conductivity of a FeCl2 solution in the pr esence of suspended Si particles was found to be consistent with the B ruggeman theory and its viscosity shows Newtonian behaviour, The Fe3mass transfer to a rotating disc electrode in the presence of Si parti cles increases with Si content in the solution at higher rotation spee ds. The cathodic polarization curves shift to slightly lower potential s and the Fe deposition current efficiency increases with increasing S i concentration. These changes are related to an increase in the rate of Fe deposition on Fe with Si particle content in the solution, Final ly, Si embedment in the Fe increases with current density between 0.25 and 2 kA m(-2).