Charge transport in the normal state of electron- or hole-doped YBa2Cu3O7-x

Citation
T. Doderer et al., Charge transport in the normal state of electron- or hole-doped YBa2Cu3O7-x, PHYS REV B, 62(9), 2000, pp. 5984-5988
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
62
Issue
9
Year of publication
2000
Pages
5984 - 5988
Database
ISI
SICI code
0163-1829(20000901)62:9<5984:CTITNS>2.0.ZU;2-D
Abstract
By using a field-effect transistor configuration, we have demonstrated that It is possible to dope electrons or holes into an initially underdoped YBa 2Cu3O7-x film at room temperature. The results of systematic measurements o f the dual-type transconductance indicate comparable field-effect mobilitie s for electrons and heres. We propose a model based on band bending and loc alized electronic states within the band gap of the Mott insulator to expla in the dual-type charge transport.