On the mechanism of porous silicon formation

Citation
Dn. Goryachev et al., On the mechanism of porous silicon formation, SEMICONDUCT, 34(9), 2000, pp. 1090-1093
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
34
Issue
9
Year of publication
2000
Pages
1090 - 1093
Database
ISI
SICI code
1063-7826(2000)34:9<1090:OTMOPS>2.0.ZU;2-3
Abstract
A new qualitative mechanism of pore nucleation and initial stages of porous silicon (por-Si) growth was proposed. The emphasis was on the charge excha nge between Si2+ ions generated by electrolytic or chemical oxidation of in itial silicon (disproportionation reaction). The mechanism eliminates, to a large extent, the contradictions typical of earlier proposed schemes of po r-Si growth; in particular, it explains the morphological features of por-S i produced under various experimental conditions. The impact of light in th ese processes was also considered. (C) 2000 MAIK "Nauka/Interperiodica".