Elemental composition and electrical properties of (a-C : H): Cu films prepared by magnetron sputtering

Amorphous hydrogenated carbon films with varied copper concentration were p repared by dc co-sputtering of graphite and copper targets in an argon-hydr ogen atmosphere. The relative atomic concentrations of carbon, copper, and oxygen were determined using proton Rutherford backscattering and the metho d of nuclear reactions. The dc conductivity of the films was studied in the in-plane and transverse geometries. The conductivity data are discussed in terms of the model of a medium in the form of a dielectric matrix containi ng two types of conducting inclusions in the form of graphite-like and copp er nanoclusters. (C) 2000 MAIK "Nauka/Interperiodica".