Embossed Bragg gratings based on organically modified silane waveguides inInP

Citation
J. Liu et al., Embossed Bragg gratings based on organically modified silane waveguides inInP, APPL OPTICS, 39(27), 2000, pp. 4942-4945
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
39
Issue
27
Year of publication
2000
Pages
4942 - 4945
Database
ISI
SICI code
0003-6935(20000920)39:27<4942:EBGBOO>2.0.ZU;2-A
Abstract
Considering the large variety of applications for optical glass waveguide g ratings, the effective production method of embossing for micropatterning, and the unique advantages of InP-based materials, we expect that hybridizat ion of embossed optical glass waveguide gratings and InP substrates will in evitably lead to new applications in integrated optics. We present our prel iminary results of research toward the development of solgel-derived glass waveguide gratings made by embossing on InP. Theoretically, the dependence of the stop-band FWHM and transmission contrast of the grating filter on th e grating length, and the relationship between the Bragg grating's reflecti ve wavelength and the dopant concentration in the solgel waveguide, are obt ained. Experimentally, using organically modified silane, we solve the prob lem of mismatching of SiO2 and InP, and successfully fabricate an embossed glass grating with a second-order Bragg reflection wavelength of 1580 nm an d a FWHM of 0.7 nm fabricated upon a solgel waveguide on an InP substrate. (C) 2000 Optical Society of America OCIS codes: 130.0130, 050.0050, 230.312 0.