Ab initio modeling of boron clustering in silicon

Citation
Xy. Liu et al., Ab initio modeling of boron clustering in silicon, APPL PHYS L, 77(13), 2000, pp. 2018-2020
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
13
Year of publication
2000
Pages
2018 - 2020
Database
ISI
SICI code
0003-6951(20000925)77:13<2018:AIMOBC>2.0.ZU;2-1
Abstract
We present results of ab initio calculations for the structure and energeti cs of boron-interstitial clusters in Si and a respective continuum model fo r the nucleation, growth, and dissolution of such clusters. The structure o f the clusters and their possible relationship to boron precipitates and in terstitial-cluster formation are discussed. We find that neither the local- density approximation nor the generalized-gradient approximation to the den sity-functional theory result in energetics that predict annealing and acti vation experiments perfectly well. However, gentle refitting of the numbers results in a model with good predictive qualities. (C) 2000 American Insti tute of Physics. [S0003- 6951(00)04539-3].