The nitrogen point defect in diamond and cubic SiC was studied using an ab-
initio plane wave pseudopotential approach that highlights the differences
in the conduction bands of the two materials. Each N defect energy level is
located relative to the various energy bands. The N defect level in diamon
d shows very little dispersion through the bands, which is indicative of it
s localized character. On the contrary, in cubic SiC the defect is far less
localized, with the level essentially depending on the occupancy of either
the C or Si site. Both sites may give n-type behavior, but N on the C site
is preferred, with a defect level substantially pinned to the conduction b
and. (C) 2000 Published by Elsevier Science S.A.