The reaction of 10-60 eV O+ ions with a silicon oxide thin film produces sc
attered O-2(-). Isotopic labeling experiments demonstrate that the O-2(-) p
roduct is formed by an abstraction reaction and not by physical sputtering.
Energy and angle resolved detection reveals a correlation between the scat
tered and incident particle momenta, indicative of a direct process in whic
h the incoming oxygen atom reacts with an adsorbed oxygen atom through an E
ley-Rideal mechanism. (C) 2000 American Institute of Physics. [S0021-9606(0
0)70737-9].