Eley-Rideal reaction of O+ with oxidized Si(100)

Citation
Cl. Quinteros et al., Eley-Rideal reaction of O+ with oxidized Si(100), J CHEM PHYS, 113(13), 2000, pp. 5119-5122
Citations number
28
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
113
Issue
13
Year of publication
2000
Pages
5119 - 5122
Database
ISI
SICI code
0021-9606(20001001)113:13<5119:EROOWO>2.0.ZU;2-X
Abstract
The reaction of 10-60 eV O+ ions with a silicon oxide thin film produces sc attered O-2(-). Isotopic labeling experiments demonstrate that the O-2(-) p roduct is formed by an abstraction reaction and not by physical sputtering. Energy and angle resolved detection reveals a correlation between the scat tered and incident particle momenta, indicative of a direct process in whic h the incoming oxygen atom reacts with an adsorbed oxygen atom through an E ley-Rideal mechanism. (C) 2000 American Institute of Physics. [S0021-9606(0 0)70737-9].