We have developed a method for encoding phase and amplitude in microsc
opic computer-generated holograms (microtags) for security application
s. An 8 x 8 cell phase-only and an 8 x 8 cell phase-and-amplitude micr
otag design has been exposed in photoresist by the extreme-ultraviolet
(13.4-nm) lithography tool developed at Sandia National Laboratories.
Each microtag measures 80 mu m X 160 mu m and contains features that
are 0.2 mu m wide. Fraunhofer zone diffraction patterns can be obtaine
d from fabricated microtags without any intervening optics and compare
favorably with predicted diffraction patterns. (C) 1996 Optical Socie
ty of America.