INVESTIGATIONS ON THE NUCLEATION PARAMETERS OF INGAAS GROWN ON INP DURING LPE

Citation
R. Jothilingam et al., INVESTIGATIONS ON THE NUCLEATION PARAMETERS OF INGAAS GROWN ON INP DURING LPE, Journal of materials science. Materials in electronics, 5(5), 1994, pp. 267-271
Citations number
27
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
09574522
Volume
5
Issue
5
Year of publication
1994
Pages
267 - 271
Database
ISI
SICI code
0957-4522(1994)5:5<267:IOTNPO>2.0.ZU;2-E
Abstract
The initial stages of LPE growth of the InGaAs ternary compound on an InP substrate were analysed using the classical heterogeneous nucleati on theory, incorporating lattice mismatch between the grown alloy and the substrate. The explicit expression for the lattice mismatch induce d supercooling for the growth of the chosen system was established, an d it was used to evaluate the nucleation parameters. It has been prove d theoretically that the nucleation barrier for the formation of InxGa 1-xAs on InP depends very strongly on the composition of the alloy; th e condition for the growth of good quality InGaAs on InP was calculate d.