Bg. Segda et al., Study and optimization of alumina and germanium dioxide and their multilayer capacitor properties, NUCL INST B, 170(1-2), 2000, pp. 105-114
To better understand the dielectric properties of alumina and germanium dio
xide multilayer capacitors, a very extensive investigation is undertaken on
the characteristics of each material. The thin layers of these oxides are
obtained by radio-frequency (RF) cathodic sputtering. An optimization of th
e dielectric properties of these materials has been done in two steps: firs
t, the analysis of the composition of the alumina and that of the germanium
dioxide by the RES technique has allowed the determination of the best con
ditions of sputtering which will give good dielectric properties. These pro
perties have been improved by thermal treatments. In addition, samples rehe
ated in three cycles from 20 degrees C to 200 degrees C for two or three da
ys went through other thermal cycles (20 degrees C to -180 degrees C, appro
ximately). These studies and investigations confirmed the influence of the
sputtering conditions on the dielectric properties. The thermal treatments
were found to improve the dielectric properties. The dielectric multilayer
capacitors have a breakdown field superior to that of each simple layer. (C
) 2000 Elsevier Science B.V. All rights reserved.