Catalytic activity of sputtered palladium films for electroless nickel plating studied using a quartz crystal microbalance

Citation
K. Kobayakawa et al., Catalytic activity of sputtered palladium films for electroless nickel plating studied using a quartz crystal microbalance, PLAT SURF F, 87(9), 2000, pp. 77-79
Citations number
12
Categorie Soggetti
Metallurgy
Journal title
PLATING AND SURFACE FINISHING
ISSN journal
03603164 → ACNP
Volume
87
Issue
9
Year of publication
2000
Pages
77 - 79
Database
ISI
SICI code
0360-3164(200009)87:9<77:CAOSPF>2.0.ZU;2-W
Abstract
The catalytic activity of palladium films sputtered on a quartz resonator w as studied using a nickel bath in which a quartz crystal microbalance was u sed to determine electroless plating processes. An adhesive interface betwe en the Pd layer and the quartz surface influenced activity. A chromium unde rlayer suppressed the catalytic activity of Pd film, but a gold underlayer did not. A palladium layer formed on Au a layer operated as a catalyst. The catalytic activity of Pd film on the Cr underlayer was greatly enhanced by cathodic treatment in dilute hydrochloric acid.