Production of thin films of Titanium nitride (TIN) with N/Ti ratios as high
as 1.3 has been achieved without destroying the metallic properties charac
teristic of stoichiometric TiN, The resultant change in mobile electron den
sity shows that by depositing thin films the onset of a rise in reflection
can be pushed out almost into the near infra red. It then becomes possible
to produce films which transmit daylight neutrally at reasonably high level
s, while still maintaining solar control in the NIR and a low emittance. Ni
trogen ion assisted cathodic are deposition has been used to achieve these
results. Both the additional impacting and implanting nitrogen ions raise s
toichiometry and help to reduce disorder so as to maintain good metallic ch
aracter, (C) 2000 Elsevier Science Ltd. All rights reserved.