Spectromicroscopy study of an Ni+Ag/Si(111) interface

The influence of the surface morphology on the local interactions of a one monolayer confined Ni film with a root 3-Ag/Si(111) interface with three-di mensional submicron-sized Ag islands has been studied by synchrotron radiat ion photoelectron spectromicroscopy with a lateral resolution of 120 nm, Th e spatially resolved two-dimensional maps and the photoelectron spectra mea sured after Ni post-deposition at 300 K and following step annealing to 970 K give evidence for the different chemical transformation of the coexistin g phases, The formation temperature and the stability of the mixed phases h ave been deduced and discussed. Copyright (C) 2000 John Wiley & Sons, Ltd.