Medium-energy ion scattering spectroscopy for quantitative surface and near-surface analysis of ultrathin films

Medium-energy Ion Scattering Spectroscopy (MEISS) can provide non-destructi ve quantitative surface and near-surface composition with atomic layer dept h resolution. The special features of MEISS can be utilized to improve quan tification of conventional surface analysis techniques by studying preferen tial sputtering, which is one of the major problems in quantitative surface analysis using sputtering techniques, This phenomenon was studied in detai l with MEISS, in situ and ex situ XPS analysis, RES, and (inductively coupl ed plasma optical emission spectrometry) for WSi2. Copyright (C) 2000 John Whey & Sons, Ltd.