An ion and electron multibeam system for three-dimensional microanalysis

The failure analysis of electronic devices and deduction of the emission or igins of dust particles in clean processes or in urban air require a precis e three-dimensional microanalysis method. In order to investigate the new t hree-dimensional microanalysis for these samples with arbitrary shape and h eterogeneity, we are developing a novel three-dimensional microanalyser con sisting of a focused electron beam for Auger mapping and a gallium focused ion beam for cross-sectioning and for time-of-flight SIMS mapping. Our mult ibeam system is based on these three purposes. An ion and electron dual foc used-beam apparatus was constructed to realize our concept, In this paper, the concept and the application of our analysis to a wire-pad contact regio n is described, The results of the elemental map in the contact interface s how the superiority of our method. Copyright (C) 2000 John Wiley & Sons, Lt d.