Friction measurements of CNx and TiCxNy films by scanning force microscopy

Coatings of CNx and TiCxNy are of great technological interest because of t heir potential for use as hard and wear-resistant coatings. In this work, C Nx and TiCxNy films have been grown on Si(100) substrates in a dual ion bea m sputtering (DIBS) system with different experimental conditions. The film s were characterized by XPS and AES depth profiles in order to determine th eir surface stoichiometry, in addition to the in-depth distribution of the components and contaminants in the film and at the interface. However, the main goal of this work was the study of the morphology and Friction propert ies of these films using scanning force microscopy, Comparative analysis be tween the CNx and TiCxNy films and an amorphous carbon sample used as a ref erence indicates the good tribological properties of these films, A correla tion between the N/C ratio and the friction coefficient was determined. In general, the F-F vs. F-N curves show a 2/3 potential dependence for low loa ds followed by a linear dependence at high loads. The power law indicates t hat single asperity geometry should be assumed, Copyright (C) 2000 John Wil ey & Sons, Ltd.