Y. Laaziz et al., Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements, THIN SOL FI, 372(1-2), 2000, pp. 149-155
In this work a method for the determination of the thickness and optical pr
operties of low optical thickness films (D < 600 nm), from the experimental
transmittance (T) and back reflectance (R') measurements, is proposed. An
original analytical formulation without any kind of approximation is employ
ed for the computations. The computing algorithm is presented in detail and
an error study is given. The method is applied for the characterization of
sputtered CdTe and a-Si thin films of optical thickness in the range of 25
0 nm. (C) 2000 Elsevier Science S.A. All rights reserved.