Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements

Citation
Y. Laaziz et al., Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements, THIN SOL FI, 372(1-2), 2000, pp. 149-155
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
372
Issue
1-2
Year of publication
2000
Pages
149 - 155
Database
ISI
SICI code
0040-6090(20000822)372:1-2<149:OCOLOT>2.0.ZU;2-8
Abstract
In this work a method for the determination of the thickness and optical pr operties of low optical thickness films (D < 600 nm), from the experimental transmittance (T) and back reflectance (R') measurements, is proposed. An original analytical formulation without any kind of approximation is employ ed for the computations. The computing algorithm is presented in detail and an error study is given. The method is applied for the characterization of sputtered CdTe and a-Si thin films of optical thickness in the range of 25 0 nm. (C) 2000 Elsevier Science S.A. All rights reserved.