Work function change caused by alkali ion sputtering of a sample surface

Authors
Kudriavtsev, Y Asomoza, R
Citation
Y. Kudriavtsev et R. Asomoza, Work function change caused by alkali ion sputtering of a sample surface, APPL SURF S, 167(1-2), 2000, pp. 12-17
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
167
Issue
1-2
Year of publication
2000
Pages
12 - 17
Database
ISI
SICI code
0169-4332(20001016)167:1-2<12:WFCCBA>2.0.ZU;2-R
Abstract
The steady state ion sputtering of a solid surface was studied. Based on a simple model, the surface concentration of ions implanted during sputtering was calculated in the case of cesium ion sputtering of silicon. The corres ponding work function shift was calculated using the model developed. (C) 2 000 Published by Elsevier Science B.V.