Characterisation of cubic boron nitride films at different stages of deposition

Citation
Ld. Jiang et al., Characterisation of cubic boron nitride films at different stages of deposition, APPL SURF S, 167(1-2), 2000, pp. 89-93
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
167
Issue
1-2
Year of publication
2000
Pages
89 - 93
Database
ISI
SICI code
0169-4332(20001016)167:1-2<89:COCBNF>2.0.ZU;2-5
Abstract
Cubic boron nitride (c-BN) films have been prepared by tuned substrate RF m agnetron sputtering with different deposition times. The films have been ch aracterised by Fourier Transform Infrared Absorption (FTIR) spectroscopy, X -ray Photoelectron Spectroscopy (XPS) and by Atomic Force Microscopy (AFM) measurements. The results show changes in composition and microstructure of the films with different deposition times that correspond to different gro wth stages of the BN films. By analysing the AFM images, we believe the BN layer formed at the early stages of deposition have a hillock morphology. ( C) 2000 Elsevier Science B.V. All rights reserved.