Cubic boron nitride (c-BN) films have been prepared by tuned substrate RF m
agnetron sputtering with different deposition times. The films have been ch
aracterised by Fourier Transform Infrared Absorption (FTIR) spectroscopy, X
-ray Photoelectron Spectroscopy (XPS) and by Atomic Force Microscopy (AFM)
measurements. The results show changes in composition and microstructure of
the films with different deposition times that correspond to different gro
wth stages of the BN films. By analysing the AFM images, we believe the BN
layer formed at the early stages of deposition have a hillock morphology. (
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