Structure and magnetic properties of electrodeposited Co films onto Si(100)

Citation
M. Cerisier et al., Structure and magnetic properties of electrodeposited Co films onto Si(100), APPL SURF S, 166(1-4), 2000, pp. 154-159
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
166
Issue
1-4
Year of publication
2000
Pages
154 - 159
Database
ISI
SICI code
0169-4332(20001009)166:1-4<154:SAMPOE>2.0.ZU;2-R
Abstract
The study of magnetic multilayers consisting of electrodeposited Co layers is gaining significant importance for the application in the field of magne tic recording. However, there are been few studies on the properties of ele ctrodeposited Co thin films. in this paper, the relation between morphology , crystallographic structure and magnetic properties of electrodeposited Co films on Si(100) and on a polycrystalline Cu substrate has been investigat ed. Co films of 100-nm thickness on Si and on Cu exhibit similar magnetic p roperties. It appears that the grain size and the interfacial roughness of the Co films do not influence significantly the magnetic properties, while the crystallographic structure plays a predominant role. We have shown that the pH of the electrolyte influences the fraction of the hcp and fee phase in the Co film and therefore tunes its magnetic properties. (C) 2000 Elsev ier Science B.V. All rights reserved.