The Auger transistor based on the Al-SiO2-n-Si heterostructure

Citation
Ev. Ostroumova et Aa. Rogachev, The Auger transistor based on the Al-SiO2-n-Si heterostructure, APPL SURF S, 166(1-4), 2000, pp. 480-484
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
166
Issue
1-4
Year of publication
2000
Pages
480 - 484
Database
ISI
SICI code
0169-4332(20001009)166:1-4<480:TATBOT>2.0.ZU;2-8
Abstract
We succeeded for the first time in creating the Auger transistor, in which in particular, we used a metal-insulator heterojunction instead of a widega p semiconductor. The Anger transistor base is created by holes, which are i nduced on silicon surface by electric field that exists in the thin oxide l ayer. The base is formed as a self-consistent quantum well near the n-silic on surface. The base width is about 10 Angstrom and the well depth is equal up to 0.7 eV, The regions of drift and impact ionization are practically s eparated in the Auger transistor. The S- and N-type instabilities of the co llector current in the Auger transistor in the case of circuit with a commo n emitter are investigated. (C) 2000 Elsevier Science B.V. All rights reser ved.